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期刊论文Deposition Kinetics and Characteristics of Peald Igzo Films Using Tetrahydrofuran-Adducted in & Ga Precursors复制

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DOI: 10.1149/MA2024-01301515mtgabs复制

文献链接: https://beta.iopscience.iop.org/article/10.1149/MA2024-01301515mtgabs/meta复制

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上一篇：Effects of Deposition Temperature on the Device Characteristics of Oxide Thin-Film Transistors Using In–Ga–Zn–O Active Channels Prepared by Atomic-Layer Deposition

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