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First principles band structure of interacting phosphorus and boron/aluminum δ -doped layers in silicon复制

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DOI: 10.1088/1361-648x/ae4555复制

文献链接: https://iopscience.iop.org/article/10.1088/1361-648X/ae4555复制

其他信息:

出版社: IOP Publishing
作者: Quinn T Campbell; Andrew D Baczewski; Shashank Misra; Evan M Anderson
全文下载地址: https://iopscience.iop.org/article/10.1088/1361-648X/ae4555/pdf

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