Boron Delta-Doping in Si : B Stacks By RP-CVD Epitaxy
DOI: 10.1149/ma2024-02322354mtgabs
文献链接: https://iopscience.iop.org/article/10.1149/MA2024-02322354mtgabs
其他信息:
出版社: The Electrochemical Society
作者: Alice Ferrandon; Fabien Deprat; Jeremy Vives; Marvin Frauenrath; Veronique Guyader; Caroline Lacomme; Ismail Madaci; Luc Favre; Isabelle Berbezier
全文下载地址: https://iopscience.iop.org/article/10.1149/MA2024-02322354mtgabs/pdf

