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Atomic layer deposition for nanoscale oxide semiconductor thin film transistors: review and outlook复制

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DOI: 10.1088/2631-7990/acb46d复制

文献链接: https://iopscience.iop.org/article/10.1088/2631-7990/acb46d复制

其他信息:

出版社: IOP Publishing
作者: Hye-Mi Kim; Dong-Gyu Kim; Yoon-Seo Kim; Minseok Kim; Jin-Seong Park
全文下载地址: https://iopscience.iop.org/article/10.1088/2631-7990/acb46d/pdf

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