Deposition Kinetics and Characteristics of Peald Igzo Films Using Tetrahydrofuran-Adducted in & Ga Precursors
DOI: 10.1149/ma2024-01301515mtgabs
文献链接: https://iopscience.iop.org/article/10.1149/MA2024-01301515mtgabs
其他信息:
出版社: The Electrochemical Society
作者: Samdong Lee; Sang-Yong Jeon; Gyun-Sang Lee; Yong-Hee Kwone; Young-Jae Im; Tae-Seok Byun; Sang-Ick Lee
全文下载地址: https://iopscience.iop.org/article/10.1149/MA2024-01301515mtgabs/pdf

